Forbrite BN-200 Bright Nickel Plating Process


               Forbrite BN-200 bright nickel plating process is a newly developed process exhibiting excellent leveling,

            brightness and covering power. It also exhibits good effect on low current density areas.

             Ⅰ. Advantages:

                  1. It produces a bright ductile and good corrosion resistant deposit.

                  2. Fast deposition rate, low additives consumption.

                  3. Good throwing power and low current density effect.

                  4. Excellent leveling property.

                  5. Deposit is white shade and process has superior tolerance to metallic impurities.

            Ⅱ. Bath compositions and operating conditions :

    Composition Range Optimum

Nickel Sulfate

230-320 g/l 280g/l
      Nickel Chloride 40-80 g/l 60 g/l
         Boric Acid 35-50 g/l 40 g/l
         BN-200 0.2-0.4 ml/l 0.3 ml/l
         BN-201 2-4  ml/l 3 ml/l
          WAA 0.4-0.5 ml/l 0.5 ml/l
        PH value 3.8- 4.2 4.0
       Temperature 50- 60 55
Cathode Current Density 1.0- 9.0 A/dm2 5.0 A/dm2
  Arode Current Density 1.0- 3.0 A/dm2 2.0 A/dm2
         Agitation Air or mechanical agitation  
         Filteration Continuons activated carbon filteation  

         Ⅲ. Function of compositon :

         1.     Nickel Sulfate

                        Nickel Sulfate or Nickel Salt is the priciple source of Nickel ion in plating bath. Under normal circumstances, it is adequate to

                   analyze the content of nickel metal and nickel sulfate weekly.

         2.     Nickel Chloride

                       Nickel Chloride increases conductivity allows higher cathode current densities operation, improves low current density deposits

                  and promotes anode corrosion.

        3.     Boric Acid

                      Boric Acid content should be maintained at the optimum recommended concentration in order to prevent problems of burning,

                 high current density exfoliation, orange peel and pitting. It also exerts a beneficial effect on brighteness, ductility and adhesion.

        4.     Forbrite BN-200

                     Forbrite BN-200 is the secondary addition agent. It should be maintained within the specified range. A low concentration will result

                in an overall loss of leveling and brightness.

        5.     Forbrite BN-201

                    Forbrite BN-201 is the primary addition agent. Due to its wide permissible concentration range, control is less critical.

                Forbrite BN-201 aids in extending the bright plating range and is essential for good leveling and ductility.

                If the concentrations of Forbrite BN-201 is somewhat below the recommended levels it may cause dull deposits in the high current density areas

             and may reduce the ampre hour life of Forbrite BN-200.

             6.     Forbrite WAA

                       The brightening agents themselves have certain wetting propenties which, in most cases, should make a wetting agent unnecessary for

               air agitated solutions. However, where the design of the parts makes air or gas entrapment a possibility, or in the event of excessive organic

               contamination, pitting could occur. In such cases, Forbrite WAA should be employed in a concentration range of 0.5-1.0cc/ l.

               The concentration of Forbrite WAA is easily controlled by surface tension analysis using a stalagmometer. 

       7.     PH control

                         It is recommended that the PH of the solution be maintained within the specified range. Lower values cause overall dull deposits and

              result in higher consumption of brightener to maintain acceptable work. Higher values of PH tend to promote better brighteness and leveling

              but cause precipitaion of iron and other metallics. Values much above 4.5 will be bright and leveled but may reduce the chromium coverage

              on somplicated parts.

      8.     Temperature

                   Forbrite BN-200 bright nickel plating process plates catisfactorily anywhere between 50-60. At the lower end of temperature range,

          slightly more current is required, conversely, higher operating temperature baths have higher bath conductility. Permitting slighthy lower voltage.

          For the highest degree of brilliance and leveling 50-60 is recommended. 

     9.     Filteration

                      Continuous filteration through activated carbon is essential to insure good quality nickel deposits. Normally, the filter is pre-coated and

              then charged with 0.1-0.3 g/l of activated carbon each week.

       10.     Agitaion

                     Forbrite BN-200 process is designed to operate with air agitaion and mechanical agitaion. It permits the use of higher current densities and

              produces an infinitely brighter, more level deposits.

   11.     Auodes

                     S-nickel rounds or 1” electrolytic squares in titanium baskets are the most popular due to price, ease of anode replacement or better anode

              efficiency. Other types of anodes, such as bar and oval, may be used if desired. 

   Ⅴ. Maintenance :

                    Consumption of Forbrite BN-200 :  7000-1000 A.H./L.

                    Consumption of Forbrite BN-201 :  5000-8000 A.H./L.

                           However, the calculation of consumption should depend upon the configuration of articles to be plated the degree of brighteness and

          leveling required. Usually, for rough works surface, higher concentration of Forbrite BN-200 is required.

         1.     When brighteness and leveling are inadequate, it is required to employ.

                     Forbrite BN-200  0.3 -0.5 cc/ l

                     Forbrite BN-201    1-3  cc/ l 

         2.     When cloud deposit in HCD and dull deposit in LCD are founded, it is required to empoly.

                     Forbrite BN-201    2-3  cc/ l

         3.     Purification of bath

       (A)   For organic contamination, it is usually treated with continuous activated carbon filteration or low PH value oxidization.

       (B)   For inorganic impurities, it is usually treated by higher PH value oxidization or dummy at 0.2-0.5 A/dm2.